The ARIS-i Reticle Inspection System is specifically designed to cater to the needs of advanced reticles utilized in device generations of 0.18 microns and below. This system offers mask makers and semiconductor manufacturers a cost-effective solution with high productivity and unparalleled data handling capabilities.

With its exceptional sensitivity down to 0.15 microns and high-speed data handling capabilities, the ARIS-i system delivers outstanding performance in inspecting intricate and densely packed reticles.

The ARIS-i Reticle Inspection System excels in analyzing reticles that utilize cutting-edge resolution enhancement techniques such as advanced optical proximity correction (OPC) and phase shift.